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Effect of applied bias voltage on corrosion-resistance for TiC1xNx and Ti1xNbxC1yNy coatings
(ElSevier, 2010)
Corrosion-resistance behavior of titanium carbon nitride (Ti–C–N) and titanium niobium carbon nitride
(Ti–Nb–C–N) coatings deposited onto Si(1 0 0) and AISI 4140 steel substrates via r.f. magnetron
sputtering process ...
Mechanical, tribological, and electrochemical behavior of Cr1xAlxN coatings deposited by r.f. reactive magnetron co-sputtering method
(ElSevier, 2010)
Chromium aluminum nitride (Cr1−xAlxN) coatings were deposited onto AISI H13 steel and silicon substrates by r.f. reactive magnetron co-sputtering in (Ar/N2) gas mixture from chromium and aluminum targets. Properties of ...
Corrosion study of Alumina/Yttria-Stabilized Zirconia (Al2O3/YSZ) nanostructured Thermal Barrier Coatings (TBC) exposed to high temperature treatment
(ElSevier, 2009)
Thermal Barrier Coatings (TBC) of 8% Yttria-Stabilized Zirconia (8YSZ) were deposited on AISI-304 substrates via r.f magnetron sputtering. A buffer layer of alumina, Al2O3, was deposited to improve the adhesion of the YSZ ...
Efecto del voltaje Bias D.C. en las propiedades electroquímicas de películas delgadas de AlN obtenidas por medio de la técnica magnetrón sputtering R.F
(2009)
Se depositaron películas delgadas de nitruro de aluminio, AlN, por el método de magnetrón sputtering r.f. reactivo usando un blanco de aluminio (99.9 %), sobre sustratos de silicio [100] y acero Rus-3, para investigar la ...